Category:Electric parts: Difference between revisions
From
No edit summary |
No edit summary |
||
| Line 3: | Line 3: | ||
=References= | =References= | ||
==Semiconductor Fabrication== | ==Semiconductor Fabrication== | ||
* [https://www.nature.com/articles/s41586-021-03625-w.pdf A natively flexible 32-bit Arm | * [https://www.nature.com/articles/s41586-021-03625-w.pdf A natively flexible 32-bit Arm microprocessor] | ||
microprocessor] | |||
* https://www.youtube.com/user/szeloof/videos | * https://www.youtube.com/user/szeloof/videos | ||
* http://sam.zeloof.xyz/first-ic/ | * http://sam.zeloof.xyz/first-ic/ | ||
Revision as of 09:47, 23 September 2021
References
Semiconductor Fabrication
- A natively flexible 32-bit Arm microprocessor
- https://www.youtube.com/user/szeloof/videos
- http://sam.zeloof.xyz/first-ic/
- [1]
- [2]
- [3]
- Kirt R. Williams, Kishan Gupta, Matthew Wasilik - Etch Rates for Micromachining Processing—Part II
- Mark R. Jackson - Effects of Radio Frequency Power and Sulfur Hexafluoride Flowrate on Etch Rate of Silicon Dioxide
- S. A. Moshkalyov, C. Reyes-Betanzo, R.C. Teixeira, I. Doi, M.B. Zakia, J.A. Diniz, J. Swart - Etching of Polycrystalline Silicon in SF6 Containing Plasmas
- I.J. Kima, H.K. Moona, J.H. Leea, N.E. Leea, J.W. Jungc, S.H. Cho - Silicon nitride etch characteristics in SF6/O2 and C3F6O/O2 plasmas and evaluation of their global warming effects
- http://microchem.com/pdf/PMMA_Data_Sheet.pdf
- http://ww2.che.ufl.edu/unit-ops-lab/experiments/semiconductors/semiconductors-index.htm
- http://sam.zeloof.xyz/category/semiconductor/
- https://www.amazon.com/dp/0130224049/?coliid=I2YFXQKLTBAQQB&colid=2HIJ0SI208R11&psc=0&ref_=lv_ov_lig_dp_it?tag=replimat-20
- Mycroft open source voice assistant
- OpenCV kit
- Wikipedia: Industrial control system
- A graph placement methodology for fast chip design
Pages in category "Electric parts"
The following 36 pages are in this category, out of 36 total.
