Category:Electric parts: Difference between revisions
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=References= | |||
==Semiconductor Fabrication== | |||
* [https://www.nature.com/articles/s41586-021-03625-w.pdf A natively flexible 32-bit Arm | |||
microprocessor] | |||
* https://www.youtube.com/user/szeloof/videos | |||
* http://sam.zeloof.xyz/first-ic/ | |||
* [https://www.yokogawa.com/yjp/solutions/solutions/minimal-fab/] | |||
* [https://www.minimalfab.com/en/] | |||
* [https://theamphour.com/390-an-interview-with-sam-zeloof/] | |||
<youtube>RJXio_jpc_Y</youtube> | |||
* Kirt R. Williams, Kishan Gupta, Matthew Wasilik - Etch Rates for Micromachining Processing—Part II | |||
* Mark R. Jackson - Effects of Radio Frequency Power and Sulfur Hexafluoride Flowrate on Etch Rate of Silicon Dioxide | |||
* S. A. Moshkalyov, C. Reyes-Betanzo, R.C. Teixeira, I. Doi, M.B. Zakia, J.A. Diniz, J. Swart - Etching of Polycrystalline Silicon in SF6 Containing Plasmas | |||
* I.J. Kima, H.K. Moona, J.H. Leea, N.E. Leea, J.W. Jungc, S.H. Cho - Silicon nitride etch characteristics in SF6/O2 and C3F6O/O2 plasmas and evaluation of their global warming effects | |||
* http://microchem.com/pdf/PMMA_Data_Sheet.pdf | |||
* http://ww2.che.ufl.edu/unit-ops-lab/experiments/semiconductors/semiconductors-index.htm | |||
* http://sam.zeloof.xyz/category/semiconductor/ | |||
* https://www.amazon.com/dp/0130224049/?coliid=I2YFXQKLTBAQQB&colid=2HIJ0SI208R11&psc=0&ref_=lv_ov_lig_dp_it?tag=replimat-20 | |||
* [https://mycroft.ai/ Mycroft open source voice assistant] | |||
* [https://www.kickstarter.com/projects/opencv/opencv-ai-kit/ OpenCV kit] | |||
* [https://en.wikipedia.org/wiki/Industrial_control_system Wikipedia: Industrial control system] | |||
* [https://www.nature.com/articles/s41586-021-03544-w.epdf?sharing_token=8za_nMkuk42509LyAn-xY9RgN0jAjWel9jnR3ZoTv0PW0K0NmVrRsFPaMa9Y5We97spjdO-aPpvZYXPHhKbfpfPljZaIm3b-kyQ3gKElVBjZIxn_5lBKsnqIIUn2YkCI3IFe5puGE49yIrhVbJrW9eUbKmMo7FS9KDgM4hs9TFFEBv1CLtLi4EFaXPirF-G_lwtOzFcc-pVSzW5vcQBQt19OPe2Fx4nUQHU5ItFuNC8%3D A graph placement methodology for fast chip design] | |||
<youtube>XVoldtNpIzI</youtube> | |||
<youtube>IS5ycm7VfXg</youtube> | |||
Revision as of 09:29, 23 September 2021
References
Semiconductor Fabrication
- [https://www.nature.com/articles/s41586-021-03625-w.pdf A natively flexible 32-bit Arm
microprocessor]
- Kirt R. Williams, Kishan Gupta, Matthew Wasilik - Etch Rates for Micromachining Processing—Part II
- Mark R. Jackson - Effects of Radio Frequency Power and Sulfur Hexafluoride Flowrate on Etch Rate of Silicon Dioxide
- S. A. Moshkalyov, C. Reyes-Betanzo, R.C. Teixeira, I. Doi, M.B. Zakia, J.A. Diniz, J. Swart - Etching of Polycrystalline Silicon in SF6 Containing Plasmas
- I.J. Kima, H.K. Moona, J.H. Leea, N.E. Leea, J.W. Jungc, S.H. Cho - Silicon nitride etch characteristics in SF6/O2 and C3F6O/O2 plasmas and evaluation of their global warming effects
- http://microchem.com/pdf/PMMA_Data_Sheet.pdf
- http://ww2.che.ufl.edu/unit-ops-lab/experiments/semiconductors/semiconductors-index.htm
- http://sam.zeloof.xyz/category/semiconductor/
- https://www.amazon.com/dp/0130224049/?coliid=I2YFXQKLTBAQQB&colid=2HIJ0SI208R11&psc=0&ref_=lv_ov_lig_dp_it?tag=replimat-20
- Mycroft open source voice assistant
- OpenCV kit
- Wikipedia: Industrial control system
- A graph placement methodology for fast chip design
Pages in category "Electric parts"
The following 36 pages are in this category, out of 36 total.
